Plasma Lab pllab.snu.ac.kr

Plasma Lab

1 New Plasma source for next generation semiconductor etcher 450mm. MICP Magnetized Inductively Coupled Plasma. Plasma proess etching, sputtering, PECVD, etc. 2 Nano-plasma NSOM, SNORM, Wave guiding. Surface Plasmon 을 이용한 측정, 구조 형성등. 3 Display Image Quality. 4 Development of Computer Simulation Code. RWCA code for nano-structured surface. 5 Plasma Display Technology. Analusis of discharge physics. Study on PDP material. 6 Eco-friendiy Flat light source. Mercury-free Flat light source Design.

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Plasma Lab

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1 New Plasma source for next generation semiconductor etcher 450mm. MICP Magnetized Inductively Coupled Plasma. Plasma proess etching, sputtering, PECVD, etc. 2 Nano-plasma NSOM, SNORM, Wave guiding. Surface Plasmon 을 이용한 측정, 구조 형성등. 3 Display Image Quality. 4 Development of Computer Simulation Code. RWCA code for nano-structured surface. 5 Plasma Display Technology. Analusis of discharge physics. Study on PDP material. 6 Eco-friendiy Flat light source. Mercury-free Flat light source Design.

CONTENT

This web site pllab.snu.ac.kr states the following, "1 New Plasma source for next generation semiconductor etcher 450mm." We noticed that the website stated " MICP Magnetized Inductively Coupled Plasma." It also said " Plasma proess etching, sputtering, PECVD, etc. 2 Nano-plasma NSOM, SNORM, Wave guiding. Surface Plasmon 을 이용한 측정, 구조 형성등. 4 Development of Computer Simulation Code. RWCA code for nano-structured surface. 6 Eco-friendiy Flat light source. Mercury-free Flat light source Design."

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